High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures

High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures

Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching and reactive ion etching. Multipen techniques have been demonstrated for the f...

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Main Authors: Fragala, Joseph, Zhang, Hua, Disawal, Sandeep, Elghanian, Robert, Shile, Roger, Amro, Nabil A.
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
DRNTU::Engineering::Materials
Online Access:https://hdl.handle.net/10356/95378
http://hdl.handle.net/10220/8613
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-953782020-06-01T10:13:41Z High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures Fragala, Joseph Zhang, Hua Disawal, Sandeep Elghanian, Robert Shile, Roger Amro, Nabil A. School of Materials Science & Engineering DRNTU::Engineering::Materials Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching and reactive ion etching. Multipen techniques have been demonstrated for the fabrication of large-area Si nanostructure arrays (see AFM image; dot 1: diameter/height=1460/140 nm; dot 9: diameter/height=385/75 nm). 2012-09-24T03:56:47Z 2019-12-06T19:13:43Z 2012-09-24T03:56:47Z 2019-12-06T19:13:43Z 2007 2007 Journal Article Zhang, H., Amro, N. A., Disawal, S., Elghanian, R., Shile, R., & Fragala, J. (2007). High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures. Small, 3(1), 81-85. 1613-6829 https://hdl.handle.net/10356/95378 http://hdl.handle.net/10220/8613 10.1002/smll.200600393 en Small © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Materials
spellingShingle DRNTU::Engineering::Materials
Fragala, Joseph
Zhang, Hua
Disawal, Sandeep
Elghanian, Robert
Shile, Roger
Amro, Nabil A.
High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
description Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching and reactive ion etching. Multipen techniques have been demonstrated for the fabrication of large-area Si nanostructure arrays (see AFM image; dot 1: diameter/height=1460/140 nm; dot 9: diameter/height=385/75 nm).
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Fragala, Joseph
Zhang, Hua
Disawal, Sandeep
Elghanian, Robert
Shile, Roger
Amro, Nabil A.
format Article
author Fragala, Joseph
Zhang, Hua
Disawal, Sandeep
Elghanian, Robert
Shile, Roger
Amro, Nabil A.
author_sort Fragala, Joseph
title High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
title_short High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
title_full High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
title_fullStr High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
title_full_unstemmed High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
title_sort high-throughput dip-pen-nanolithography-based fabrication of si nanostructures
publishDate 2012
url https://hdl.handle.net/10356/95378
http://hdl.handle.net/10220/8613
_version_ 1681056921541410816

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