High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures

• Main Authors: Fragala, Joseph, Zhang, Hua, Disawal, Sandeep, Elghanian, Robert, Shile, Roger, Amro, Nabil A.
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/95378; http://hdl.handle.net/10220/8613
• Institution: Nanyang Technological University

Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching and reactive ion etching. Multipen techniques have been demonstrated for the f...