Effect of N incorporation on the characteristics of InSbN P–N diodes

We report on the effect of N incorporation in the characteristics of the 2 μm thick InSbN photoabsorption layer of a p–n diode grown by molecular beam epitaxy using a radio-frequency plasma-assisted nitrogen source. As compared to N free InSb layer, the absorption wavelength extends to near 9 μm. On...

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Bibliographic Details
Main Authors: Pham, H. T., Lim, Kim Peow, Yoon, Soon Fatt, Tan, Kian Hua
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/96475
http://hdl.handle.net/10220/10288
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Institution: Nanyang Technological University
Language: English