Effect of N incorporation on the characteristics of InSbN P–N diodes

We report on the effect of N incorporation in the characteristics of the 2 μm thick InSbN photoabsorption layer of a p–n diode grown by molecular beam epitaxy using a radio-frequency plasma-assisted nitrogen source. As compared to N free InSb layer, the absorption wavelength extends to near 9 μm. On...

Full description

Saved in:
Bibliographic Details
Main Authors: Pham, H. T., Lim, Kim Peow, Yoon, Soon Fatt, Tan, Kian Hua
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/96475
http://hdl.handle.net/10220/10288
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
Be the first to leave a comment!
You must be logged in first