Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers

Conductance bistability in Pt/Si–vinylidene fluoride (VDF) oligomer–Au ferroelectric tunnel junction devices is demonstrated. I–V and C–V measurements reveal bistable conductance switching within biasing voltage of ±0.5V with stable memory retention up to 1 × 104 cycles. The memory element exhibits...

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Main Authors: Kusuma, Damar Yoga, Lee, Pooi See
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/97095
http://hdl.handle.net/10220/10458
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-970952020-06-01T10:13:35Z Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers Kusuma, Damar Yoga Lee, Pooi See School of Materials Science & Engineering Conductance bistability in Pt/Si–vinylidene fluoride (VDF) oligomer–Au ferroelectric tunnel junction devices is demonstrated. I–V and C–V measurements reveal bistable conductance switching within biasing voltage of ±0.5V with stable memory retention up to 1 × 104 cycles. The memory element exhibits a low switching voltage of ±1.0 V, coincides with the coercive field of the ferroelectric VDF oligomer monolayer films in use. 2013-06-17T07:15:00Z 2019-12-06T19:38:55Z 2013-06-17T07:15:00Z 2019-12-06T19:38:55Z 2012 2012 Journal Article Kusuma, D. Y., & Lee, P. S. (2012). Ferroelectric Tunnel Junction Memory Devices made from Monolayers of Vinylidene Fluoride Oligomers. Advanced Materials, 24(30), 4163-4169. 1521-4095 https://hdl.handle.net/10356/97095 http://hdl.handle.net/10220/10458 10.1002/adma.201104476 en Advanced materials © 2012 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
description Conductance bistability in Pt/Si–vinylidene fluoride (VDF) oligomer–Au ferroelectric tunnel junction devices is demonstrated. I–V and C–V measurements reveal bistable conductance switching within biasing voltage of ±0.5V with stable memory retention up to 1 × 104 cycles. The memory element exhibits a low switching voltage of ±1.0 V, coincides with the coercive field of the ferroelectric VDF oligomer monolayer films in use.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Kusuma, Damar Yoga
Lee, Pooi See
format Article
author Kusuma, Damar Yoga
Lee, Pooi See
spellingShingle Kusuma, Damar Yoga
Lee, Pooi See
Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
author_sort Kusuma, Damar Yoga
title Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_short Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_full Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_fullStr Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_full_unstemmed Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_sort ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
publishDate 2013
url https://hdl.handle.net/10356/97095
http://hdl.handle.net/10220/10458
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