Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD

Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its...

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書目詳細資料
Main Authors:	Zhu, Yuhe, Wang, Wei, Jia, Xingya, Akasaka, Tsukasa, Liao, Susan, Watari, Fumio
其他作者:	School of Materials Science & Engineering
格式:	Article
語言:	English
出版:	2013
在線閱讀:	https://hdl.handle.net/10356/99245 http://hdl.handle.net/10220/11022
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	Nanyang Technological University
語言:	English

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