Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors:	Lu, B., Taylor, J.W., Cerrina, F., Soo, C.P., Bourdillon, A.J.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/107215
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-107215
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spelling	sg-nus-scholar.10635-1072152015-01-16T05:57:59Z Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique Lu, B. Taylor, J.W. Cerrina, F. Soo, C.P. Bourdillon, A.J. MATERIALS SCIENCE Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 17 6 3345-3350 JVTBD 2014-10-29T08:41:05Z 2014-10-29T08:41:05Z 1999 Article Lu, B.,Taylor, J.W.,Cerrina, F.,Soo, C.P.,Bourdillon, A.J. (1999). Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 17 (6) : 3345-3350. ScholarBank@NUS Repository. 10711023 http://scholarbank.nus.edu.sg/handle/10635/107215 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Lu, B. Taylor, J.W. Cerrina, F. Soo, C.P. Bourdillon, A.J.
format	Article
author	Lu, B. Taylor, J.W. Cerrina, F. Soo, C.P. Bourdillon, A.J.
spellingShingle	Lu, B. Taylor, J.W. Cerrina, F. Soo, C.P. Bourdillon, A.J. Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
author_sort	Lu, B.
title	Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
title_short	Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
title_full	Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
title_fullStr	Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
title_full_unstemmed	Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
title_sort	study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/107215
_version_	1681093604597039104

Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique

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