Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique

• Main Authors: Lu, B., Taylor, J.W., Cerrina, F., Soo, C.P., Bourdillon, A.J.
• Other Authors: MATERIALS SCIENCE
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/107215
• Institution: National University of Singapore

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures