Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications

10.1023/A:1006616917188

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Bibliographic Details
Main Authors:	Lim, C.W., Bourdillon, A.J., Gong, H., Lahiri, S.K., Pey, K.L., Lee, K.H.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/107218
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-1072182023-10-29T21:47:11Z Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications Lim, C.W. Bourdillon, A.J. Gong, H. Lahiri, S.K. Pey, K.L. Lee, K.H. MATERIALS SCIENCE 10.1023/A:1006616917188 Journal of Materials Science Letters 18 9 743-746 JMSLD 2014-10-29T08:41:07Z 2014-10-29T08:41:07Z 1999 Article Lim, C.W., Bourdillon, A.J., Gong, H., Lahiri, S.K., Pey, K.L., Lee, K.H. (1999). Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications. Journal of Materials Science Letters 18 (9) : 743-746. ScholarBank@NUS Repository. https://doi.org/10.1023/A:1006616917188 02618028 http://scholarbank.nus.edu.sg/handle/10635/107218 000081237000023 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1023/A:1006616917188
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Lim, C.W. Bourdillon, A.J. Gong, H. Lahiri, S.K. Pey, K.L. Lee, K.H.
format	Article
author	Lim, C.W. Bourdillon, A.J. Gong, H. Lahiri, S.K. Pey, K.L. Lee, K.H.
spellingShingle	Lim, C.W. Bourdillon, A.J. Gong, H. Lahiri, S.K. Pey, K.L. Lee, K.H. Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications
author_sort	Lim, C.W.
title	Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications
title_short	Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications
title_full	Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications
title_fullStr	Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications
title_full_unstemmed	Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications
title_sort	study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ulsi applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/107218
_version_	1781788358811320320

Study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications

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