Elimination of 'bottom pinching' effect in environmentally stable chemically amplified resist
10.1117/12.308790
Saved in:
Main Authors: | Soo, C.P., Fan, M.H., Bourdillon, A.J., Chan, L. |
---|---|
Other Authors: | MATERIALS SCIENCE |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/107271 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Enhancement or reduction of catalytic dissolution reaction in chemically amplified resists by substrate contaminants
by: Soo, C.P., et al.
Published: (2014) -
Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique
by: Lu, B., et al.
Published: (2014) -
Segmented pinch analysis for environmental risk management
by: Wang, Fang, et al.
Published: (2017) -
PinchList: Leveraging pinch gestures for hierarchical list navigation on smartphones
by: HAN, Teng, et al.
Published: (2019) -
Pinch.
by: Koh, Kim Joo., et al.
Published: (2012)