Exposure parameters in proton beam writing for hydrogen silsesquioxane

10.1016/j.nimb.2007.12.081

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Bibliographic Details
Main Authors:	van Kan, J.A., Zhang, F., Zhang, C., Bettiol, A.A., Watt, F.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	Direct write High aspect ratio Nanolithography Proton beam writing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/112597
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-112597
record_format	dspace
spelling	sg-nus-scholar.10635-1125972023-10-25T22:40:13Z Exposure parameters in proton beam writing for hydrogen silsesquioxane van Kan, J.A. Zhang, F. Zhang, C. Bettiol, A.A. Watt, F. PHYSICS NUS NANOSCIENCE & NANOTECH INITIATIVE Direct write High aspect ratio Nanolithography Proton beam writing 10.1016/j.nimb.2007.12.081 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 266 8 1676-1679 NIMBE 2014-11-28T06:33:15Z 2014-11-28T06:33:15Z 2008-04 Article van Kan, J.A., Zhang, F., Zhang, C., Bettiol, A.A., Watt, F. (2008-04). Exposure parameters in proton beam writing for hydrogen silsesquioxane. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms 266 (8) : 1676-1679. ScholarBank@NUS Repository. https://doi.org/10.1016/j.nimb.2007.12.081 0168583X http://scholarbank.nus.edu.sg/handle/10635/112597 000256677600108 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Direct write High aspect ratio Nanolithography Proton beam writing
spellingShingle	Direct write High aspect ratio Nanolithography Proton beam writing van Kan, J.A. Zhang, F. Zhang, C. Bettiol, A.A. Watt, F. Exposure parameters in proton beam writing for hydrogen silsesquioxane
description	10.1016/j.nimb.2007.12.081
author2	PHYSICS
author_facet	PHYSICS van Kan, J.A. Zhang, F. Zhang, C. Bettiol, A.A. Watt, F.
format	Article
author	van Kan, J.A. Zhang, F. Zhang, C. Bettiol, A.A. Watt, F.
author_sort	van Kan, J.A.
title	Exposure parameters in proton beam writing for hydrogen silsesquioxane
title_short	Exposure parameters in proton beam writing for hydrogen silsesquioxane
title_full	Exposure parameters in proton beam writing for hydrogen silsesquioxane
title_fullStr	Exposure parameters in proton beam writing for hydrogen silsesquioxane
title_full_unstemmed	Exposure parameters in proton beam writing for hydrogen silsesquioxane
title_sort	exposure parameters in proton beam writing for hydrogen silsesquioxane
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/112597
_version_	1781789100604391424

Exposure parameters in proton beam writing for hydrogen silsesquioxane

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