Exposure parameters in proton beam writing for hydrogen silsesquioxane

• Main Authors: van Kan, J.A., Zhang, F., Zhang, C., Bettiol, A.A., Watt, F.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: Direct write; High aspect ratio; Nanolithography; Proton beam writing
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/112597
• Institution: National University of Singapore

10.1016/j.nimb.2007.12.081