Exposure parameters in proton beam writing for hydrogen silsesquioxane

Exposure parameters in proton beam writing for hydrogen silsesquioxane

10.1016/j.nimb.2007.12.081

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Bibliographic Details
Main Authors: van Kan, J.A., Zhang, F., Zhang, C., Bettiol, A.A., Watt, F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Direct write
High aspect ratio
Nanolithography
Proton beam writing
Online Access:http://scholarbank.nus.edu.sg/handle/10635/112597
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/112597

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