Effect of oxide field on hot carrier induced degradation in CMOS gate oxide
Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA
Saved in:
Main Authors: | , |
---|---|
其他作者: | |
格式: | Conference or Workshop Item |
出版: |
2014
|
在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/112976 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|