Effect of oxide field on hot carrier induced degradation in CMOS gate oxide

Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA

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書目詳細資料
Main Authors: Zhao, S.P., Taylor, S.
其他作者: INSTITUTE OF MICROELECTRONICS
格式: Conference or Workshop Item
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/112976
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