Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication

10.1149/1.1510843

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Bibliographic Details
Main Authors:	Chen, S.Y., Shen, Z.X., Xu, S.Y., Ong, C.K., See, A.K., Chan, L.H.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/113079
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-113079
record_format	dspace
spelling	sg-nus-scholar.10635-1130792023-10-26T21:28:02Z Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication Chen, S.Y. Shen, Z.X. Xu, S.Y. Ong, C.K. See, A.K. Chan, L.H. PHYSICS INSTITUTE OF ENGINEERING SCIENCE 10.1149/1.1510843 Journal of the Electrochemical Society 149 11 G609-G612 JESOA 2014-11-28T09:11:45Z 2014-11-28T09:11:45Z 2002-11 Article Chen, S.Y., Shen, Z.X., Xu, S.Y., Ong, C.K., See, A.K., Chan, L.H. (2002-11). Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication. Journal of the Electrochemical Society 149 (11) : G609-G612. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1510843 00134651 http://scholarbank.nus.edu.sg/handle/10635/113079 000178620700055 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.1510843
author2	PHYSICS
author_facet	PHYSICS Chen, S.Y. Shen, Z.X. Xu, S.Y. Ong, C.K. See, A.K. Chan, L.H.
format	Article
author	Chen, S.Y. Shen, Z.X. Xu, S.Y. Ong, C.K. See, A.K. Chan, L.H.
spellingShingle	Chen, S.Y. Shen, Z.X. Xu, S.Y. Ong, C.K. See, A.K. Chan, L.H. Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
author_sort	Chen, S.Y.
title	Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
title_short	Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
title_full	Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
title_fullStr	Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
title_full_unstemmed	Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
title_sort	excimer laser-induced ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/113079
_version_	1781789163145658368

Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication

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