Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication

Excimer laser-induced Ti silicidation to eliminate the fine-line effect for integrated circuit device fabrication

10.1149/1.1510843

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Bibliographic Details
Main Authors: Chen, S.Y., Shen, Z.X., Xu, S.Y., Ong, C.K., See, A.K., Chan, L.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113079
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Institution: National University of Singapore
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