Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon

10.1063/1.3264572

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Main Authors: Dingemans, G., Engelhart, P., Seguin, R., Einsele, F., Hoex, B., Van De Sanden, M.C.M., Kessels, W.M.M.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113251
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1132512023-10-29T21:41:46Z Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon Dingemans, G. Engelhart, P. Seguin, R. Einsele, F. Hoex, B. Van De Sanden, M.C.M. Kessels, W.M.M. SOLAR ENERGY RESEARCH INST OF S'PORE 10.1063/1.3264572 Journal of Applied Physics 106 11 - JAPIA 2014-11-30T06:41:24Z 2014-11-30T06:41:24Z 2009 Article Dingemans, G., Engelhart, P., Seguin, R., Einsele, F., Hoex, B., Van De Sanden, M.C.M., Kessels, W.M.M. (2009). Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon. Journal of Applied Physics 106 (11) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3264572 00218979 http://scholarbank.nus.edu.sg/handle/10635/113251 000272838600155 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.3264572
author2 SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet SOLAR ENERGY RESEARCH INST OF S'PORE
Dingemans, G.
Engelhart, P.
Seguin, R.
Einsele, F.
Hoex, B.
Van De Sanden, M.C.M.
Kessels, W.M.M.
format Article
author Dingemans, G.
Engelhart, P.
Seguin, R.
Einsele, F.
Hoex, B.
Van De Sanden, M.C.M.
Kessels, W.M.M.
spellingShingle Dingemans, G.
Engelhart, P.
Seguin, R.
Einsele, F.
Hoex, B.
Van De Sanden, M.C.M.
Kessels, W.M.M.
Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon
author_sort Dingemans, G.
title Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon
title_short Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon
title_full Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon
title_fullStr Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon
title_full_unstemmed Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon
title_sort stability of al2o3 and al2o3/a- sinx:h stacks for surface passivation of crystalline silicon
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/113251
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