Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon

Stability of Al2O3 and Al2O3/a- SiNx:H stacks for surface passivation of crystalline silicon

10.1063/1.3264572

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Bibliographic Details
Main Authors: Dingemans, G., Engelhart, P., Seguin, R., Einsele, F., Hoex, B., Van De Sanden, M.C.M., Kessels, W.M.M.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113251
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/113251

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