Fast Vth instability in HfO2 gate dielectric MOSFETs and Its impact on digital circuits

10.1109/RELPHY.2006.251308

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Bibliographic Details
Main Authors: Shen, C., Yang, T., Li, M.-F., Samudra, G., Yeo, Y.-C., Zhu, C.X., Rustagi, S.C., Yut, M.B., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/114559
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Institution: National University of Singapore
Description
Summary:10.1109/RELPHY.2006.251308