Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface
10.1016/j.cplett.2004.02.097
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sg-nus-scholar.10635-1158562023-10-25T22:56:12Z Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface Xie, X.N. Chung, H.J. Sow, C.H. Wee, A.T.S. NUS NANOSCIENCE & NANOTECH INITIATIVE PHYSICS 10.1016/j.cplett.2004.02.097 Chemical Physics Letters 388 4-6 446-451 CHPLB 2014-12-12T07:33:20Z 2014-12-12T07:33:20Z 2004-04-21 Article Xie, X.N., Chung, H.J., Sow, C.H., Wee, A.T.S. (2004-04-21). Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface. Chemical Physics Letters 388 (4-6) : 446-451. ScholarBank@NUS Repository. https://doi.org/10.1016/j.cplett.2004.02.097 00092614 http://scholarbank.nus.edu.sg/handle/10635/115856 000220935600041 Scopus |
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10.1016/j.cplett.2004.02.097 |
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NUS NANOSCIENCE & NANOTECH INITIATIVE |
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NUS NANOSCIENCE & NANOTECH INITIATIVE Xie, X.N. Chung, H.J. Sow, C.H. Wee, A.T.S. |
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Article |
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Xie, X.N. Chung, H.J. Sow, C.H. Wee, A.T.S. |
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Xie, X.N. Chung, H.J. Sow, C.H. Wee, A.T.S. Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface |
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Xie, X.N. |
title |
Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface |
title_short |
Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface |
title_full |
Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface |
title_fullStr |
Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface |
title_full_unstemmed |
Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface |
title_sort |
oxide growth and its dielectrical properties on alkylsilated native-sio2/si surface |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/115856 |
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