Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface
10.1016/j.cplett.2004.02.097
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Main Authors: | Xie, X.N., Chung, H.J., Sow, C.H., Wee, A.T.S. |
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Other Authors: | NUS NANOSCIENCE & NANOTECH INITIATIVE |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115856 |
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Institution: | National University of Singapore |
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