Oxide growth and its dielectrical properties on alkylsilated native-SiO2/Si surface

10.1016/j.cplett.2004.02.097

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Bibliographic Details
Main Authors:	Xie, X.N., Chung, H.J., Sow, C.H., Wee, A.T.S.
Other Authors:	NUS NANOSCIENCE & NANOTECH INITIATIVE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/115856
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Institution:	National University of Singapore

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