Plasma charging damage in deep sub-micron CMOS devices

• Main Author: TEO WEI YEE, JOCELYN
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Theses and Dissertations
• Language: English
• Published: 2010
• Subjects: MOS device, plasma charging damage, gate oxide, antenna, high density plasma, interconnect layer
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/13472
• Institution: National University of Singapore

Master's