Plasma charging damage in deep sub-micron CMOS devices
Master's
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sg-nus-scholar.10635-134722024-10-26T08:05:33Z Plasma charging damage in deep sub-micron CMOS devices TEO WEI YEE, JOCELYN ELECTRICAL & COMPUTER ENGINEERING LI MING-FU MOS device, plasma charging damage, gate oxide, antenna, high density plasma, interconnect layer Master's MASTER OF ENGINEERING 2010-04-08T10:33:19Z 2010-04-08T10:33:19Z 2003-10-27 Thesis TEO WEI YEE, JOCELYN (2003-10-27). Plasma charging damage in deep sub-micron CMOS devices. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/13472 NOT_IN_WOS en |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
language |
English |
topic |
MOS device, plasma charging damage, gate oxide, antenna, high density plasma, interconnect layer |
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MOS device, plasma charging damage, gate oxide, antenna, high density plasma, interconnect layer TEO WEI YEE, JOCELYN Plasma charging damage in deep sub-micron CMOS devices |
description |
Master's |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING TEO WEI YEE, JOCELYN |
format |
Theses and Dissertations |
author |
TEO WEI YEE, JOCELYN |
author_sort |
TEO WEI YEE, JOCELYN |
title |
Plasma charging damage in deep sub-micron CMOS devices |
title_short |
Plasma charging damage in deep sub-micron CMOS devices |
title_full |
Plasma charging damage in deep sub-micron CMOS devices |
title_fullStr |
Plasma charging damage in deep sub-micron CMOS devices |
title_full_unstemmed |
Plasma charging damage in deep sub-micron CMOS devices |
title_sort |
plasma charging damage in deep sub-micron cmos devices |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/13472 |
_version_ |
1821222140754526208 |