THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING

Master's

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Bibliographic Details
Main Author: XU MIN
Other Authors: CHEMICAL & ENVIRONMENTAL ENGINEERING
Format: Theses and Dissertations
Published: 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/153138
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Institution: National University of Singapore