THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING
Master's
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| Format: | Theses and Dissertations |
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2019
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| Online Access: | https://scholarbank.nus.edu.sg/handle/10635/153138 |
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sg-nus-scholar.10635-1531382020-11-19T13:56:57Z THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING XU MIN CHEMICAL & ENVIRONMENTAL ENGINEERING KO TZE-MAN Master's MASTER OF ENGINEERING 2019-04-15T04:19:30Z 2019-04-15T04:19:30Z 2000 Thesis XU MIN (2000). THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/153138 CCK BATCHLOAD 20190405 |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
Master's |
| author2 |
CHEMICAL & ENVIRONMENTAL ENGINEERING |
| author_facet |
CHEMICAL & ENVIRONMENTAL ENGINEERING XU MIN |
| format |
Theses and Dissertations |
| author |
XU MIN |
| spellingShingle |
XU MIN THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING |
| author_sort |
XU MIN |
| title |
THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING |
| title_short |
THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING |
| title_full |
THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING |
| title_fullStr |
THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING |
| title_full_unstemmed |
THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING |
| title_sort |
use of pecvd silicon oxynitride thin-films in microelectronics manufacturing |
| publishDate |
2019 |
| url |
https://scholarbank.nus.edu.sg/handle/10635/153138 |
| _version_ |
1686108198794166272 |