THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING
Master's
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Main Author: | XU MIN |
---|---|
Other Authors: | CHEMICAL & ENVIRONMENTAL ENGINEERING |
Format: | Theses and Dissertations |
Published: |
2019
|
Online Access: | https://scholarbank.nus.edu.sg/handle/10635/153138 |
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Institution: | National University of Singapore |
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