FIN FET SIDE WALL FORMATION, CHARACTERIZATION AND RELATED SIMULATION

FIN FET SIDE WALL FORMATION, CHARACTERIZATION AND RELATED SIMULATION

Master's

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Bibliographic Details
Main Author: LIU JIN
Other Authors: SINGAPORE-MIT ALLIANCE
Format: Theses and Dissertations
Published: 2019
Subjects:
Fin FET
MOS Capacitor
lateral etching
TMA Tsuprem4TM and MediciTM
C-V characteristics
I-V characteristics
Layout Design
Interface Charge
Oxide Charge
Depletion Width
Online Access:https://scholarbank.nus.edu.sg/handle/10635/154034
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Institution: National University of Singapore

Internet

https://scholarbank.nus.edu.sg/handle/10635/154034

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