Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices

Ph.D

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Bibliographic Details
Main Author:	YEO CHIA CHING
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	Hafnium, high-K, dielectric, mobility, Silicon, Germanium
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15410
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-15410
record_format	dspace
spelling	sg-nus-scholar.10635-154102024-10-26T01:55:53Z Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices YEO CHIA CHING ELECTRICAL & COMPUTER ENGINEERING CHO BYUNG-JIN Hafnium, high-K, dielectric, mobility, Silicon, Germanium Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:53:15Z 2010-04-08T10:53:15Z 2006-05-28 Thesis YEO CHIA CHING (2006-05-28). Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15410 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
language	English
topic	Hafnium, high-K, dielectric, mobility, Silicon, Germanium
spellingShingle	Hafnium, high-K, dielectric, mobility, Silicon, Germanium YEO CHIA CHING Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING YEO CHIA CHING
format	Theses and Dissertations
author	YEO CHIA CHING
author_sort	YEO CHIA CHING
title	Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices
title_short	Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices
title_full	Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices
title_fullStr	Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices
title_full_unstemmed	Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices
title_sort	hf-based high-k gate dielectric on high mobility channel for advanced cmos devices
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/15410
_version_	1821185064099119104

Hf-based high-K gate dielectric on high mobility channel for advanced CMOS devices

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