Study of strain relaxation in semiconductors by convergent beam electron diffraction

Study of strain relaxation in semiconductors by convergent beam electron diffraction

Ph.D

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Bibliographic Details
Main Author: TOH SUEY LI
Other Authors: CHEMISTRY
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
convergent beam electron diffraction, uniaxial and biaxial strain, etch-stop layer, trench structures, silicidation, SiGe/Si heterostructures
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15501
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Institution: National University of Singapore
Language: English

Internet

http://scholarbank.nus.edu.sg/handle/10635/15501

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