$Study of strain relaxation in semiconductors by convergent beam electron diffraction$

Study of strain relaxation in semiconductors by convergent beam electron diffraction

Ph.D

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Bibliographic Details
Main Author:	TOH SUEY LI
Other Authors:	CHEMISTRY
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	convergent beam electron diffraction, uniaxial and biaxial strain, etch-stop layer, trench structures, silicidation, SiGe/Si heterostructures
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15501
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Institution:	National University of Singapore
Language:	English

Description
Summary:	Ph.D

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