Strain Engineering for Enhanced P-channel Field Effect Transistor Performance

Strain Engineering for Enhanced P-channel Field Effect Transistor Performance

Master's

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Bibliographic Details
Main Author: LIU FANGYUE
Other Authors: NANOENGINEERING PROGRAMME
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Strain Engineering, p-channel transistor, SiGe S/D, Reverse embedded Si:C stressor, Sn Strain compenstation implant, Germanium Enrichment
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15838
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Institution: National University of Singapore
Language: English
Description
Summary:Master's

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