Strain Engineering for Enhanced P-channel Field Effect Transistor Performance

Strain Engineering for Enhanced P-channel Field Effect Transistor Performance

Master's

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Bibliographic Details
Main Author:	LIU FANGYUE
Other Authors:	NANOENGINEERING PROGRAMME
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	Strain Engineering, p-channel transistor, SiGe S/D, Reverse embedded Si:C stressor, Sn Strain compenstation implant, Germanium Enrichment
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15838
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Institution:	National University of Singapore
Language:	English

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