Advanced source and drain contact engineering for multiple- gate transistors
Ph.D
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sg-nus-scholar.10635-177222015-02-01T07:02:32Z Advanced source and drain contact engineering for multiple- gate transistors LEE TEK PO RINUS ELECTRICAL & COMPUTER ENGINEERING YEO YEE CHIA CHI DONGZHI Silicide, FinFET, CMOS, Schottky Barrier, NiSi Ph.D DOCTOR OF PHILOSOPHY 2010-07-15T18:01:35Z 2010-07-15T18:01:35Z 2009-08-18 Thesis LEE TEK PO RINUS (2009-08-18). Advanced source and drain contact engineering for multiple- gate transistors. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/17722 NOT_IN_WOS en |
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National University of Singapore |
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ScholarBank@NUS |
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Silicide, FinFET, CMOS, Schottky Barrier, NiSi |
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Silicide, FinFET, CMOS, Schottky Barrier, NiSi LEE TEK PO RINUS Advanced source and drain contact engineering for multiple- gate transistors |
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Ph.D |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING LEE TEK PO RINUS |
format |
Theses and Dissertations |
author |
LEE TEK PO RINUS |
author_sort |
LEE TEK PO RINUS |
title |
Advanced source and drain contact engineering for multiple- gate transistors |
title_short |
Advanced source and drain contact engineering for multiple- gate transistors |
title_full |
Advanced source and drain contact engineering for multiple- gate transistors |
title_fullStr |
Advanced source and drain contact engineering for multiple- gate transistors |
title_full_unstemmed |
Advanced source and drain contact engineering for multiple- gate transistors |
title_sort |
advanced source and drain contact engineering for multiple- gate transistors |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/17722 |
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