Defect Engineering in the formation of Ultra-shallow junctions for advanced nano-metal-oxide-semiconductor technology

Ph.D

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Bibliographic Details
Main Author:	YEONG SAI HOOI
Other Authors:	CHEMICAL & BIOMOLECULAR ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2011
Subjects:	Ultra-shallow junctions (USJs), defects, dopants, co-implantation, annealing, surface.
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/19033
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Institution:	National University of Singapore
Language:	English

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