Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability

Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability

10.1016/j.mseb.2008.10.013

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Bibliographic Details
Main Authors: Mok, K.R.C., Yeong, S.H., Colombeau, B., Benistant, F., Poon, C.H., Chan, L., Srinivasan, M.P.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
Subjects:
Advanced annealing technique
Atomistic simulation
Diffusion
Dopant deactivation
Flash lamp annealing
Junction stability
Online Access:http://scholarbank.nus.edu.sg/handle/10635/63888
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/63888

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