Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability

10.1016/j.mseb.2008.10.013

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Main Authors: Mok, K.R.C., Yeong, S.H., Colombeau, B., Benistant, F., Poon, C.H., Chan, L., Srinivasan, M.P.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/63888
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-638882023-10-30T07:29:32Z Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability Mok, K.R.C. Yeong, S.H. Colombeau, B. Benistant, F. Poon, C.H. Chan, L. Srinivasan, M.P. CHEMICAL & BIOMOLECULAR ENGINEERING Advanced annealing technique Atomistic simulation Diffusion Dopant deactivation Flash lamp annealing Junction stability 10.1016/j.mseb.2008.10.013 Materials Science and Engineering B: Solid-State Materials for Advanced Technology 154-155 1-3 14-19 MSBTE 2014-06-17T07:40:44Z 2014-06-17T07:40:44Z 2008-12-05 Article Mok, K.R.C., Yeong, S.H., Colombeau, B., Benistant, F., Poon, C.H., Chan, L., Srinivasan, M.P. (2008-12-05). Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 154-155 (1-3) : 14-19. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mseb.2008.10.013 09215107 http://scholarbank.nus.edu.sg/handle/10635/63888 000262187600003 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Advanced annealing technique
Atomistic simulation
Diffusion
Dopant deactivation
Flash lamp annealing
Junction stability
spellingShingle Advanced annealing technique
Atomistic simulation
Diffusion
Dopant deactivation
Flash lamp annealing
Junction stability
Mok, K.R.C.
Yeong, S.H.
Colombeau, B.
Benistant, F.
Poon, C.H.
Chan, L.
Srinivasan, M.P.
Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
description 10.1016/j.mseb.2008.10.013
author2 CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet CHEMICAL & BIOMOLECULAR ENGINEERING
Mok, K.R.C.
Yeong, S.H.
Colombeau, B.
Benistant, F.
Poon, C.H.
Chan, L.
Srinivasan, M.P.
format Article
author Mok, K.R.C.
Yeong, S.H.
Colombeau, B.
Benistant, F.
Poon, C.H.
Chan, L.
Srinivasan, M.P.
author_sort Mok, K.R.C.
title Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
title_short Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
title_full Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
title_fullStr Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
title_full_unstemmed Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
title_sort experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/63888
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