High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers

10.1109/JEDS.2020.2967406

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Main Authors: Khai, L.W., Geok Ing, N., Fitzgerald, E.A., Soon Fatt, Y., Yue, W., Kwang Hong, L., Zhihong, L., Hanlin, X., Siau Ben, C., Eng Kian, K.L., Xing, Z., Tan, C.S.
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Published: Institute of Electrical and Electronics Engineers Inc. 2021
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Online Access:https://scholarbank.nus.edu.sg/handle/10635/197878
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spelling sg-nus-scholar.10635-1978782024-04-25T03:31:19Z High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers Khai, L.W. Geok Ing, N. Fitzgerald, E.A. Soon Fatt, Y. Yue, W. Kwang Hong, L. Zhihong, L. Hanlin, X. Siau Ben, C. Eng Kian, K.L. Xing, Z. Tan, C.S. ELECTRICAL AND COMPUTER ENGINEERING bipolar transistors III-V/Si integration semiconductor growth 10.1109/JEDS.2020.2967406 IEEE Journal of the Electron Devices Society 8 122-125 2021-08-19T02:17:26Z 2021-08-19T02:17:26Z 2020 Article Khai, L.W., Geok Ing, N., Fitzgerald, E.A., Soon Fatt, Y., Yue, W., Kwang Hong, L., Zhihong, L., Hanlin, X., Siau Ben, C., Eng Kian, K.L., Xing, Z., Tan, C.S. (2020). High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers. IEEE Journal of the Electron Devices Society 8 : 122-125. ScholarBank@NUS Repository. https://doi.org/10.1109/JEDS.2020.2967406 21686734 https://scholarbank.nus.edu.sg/handle/10635/197878 Institute of Electrical and Electronics Engineers Inc. Scopus OA2020
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic bipolar transistors
III-V/Si integration
semiconductor growth
spellingShingle bipolar transistors
III-V/Si integration
semiconductor growth
Khai, L.W.
Geok Ing, N.
Fitzgerald, E.A.
Soon Fatt, Y.
Yue, W.
Kwang Hong, L.
Zhihong, L.
Hanlin, X.
Siau Ben, C.
Eng Kian, K.L.
Xing, Z.
Tan, C.S.
High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers
description 10.1109/JEDS.2020.2967406
author2 ELECTRICAL AND COMPUTER ENGINEERING
author_facet ELECTRICAL AND COMPUTER ENGINEERING
Khai, L.W.
Geok Ing, N.
Fitzgerald, E.A.
Soon Fatt, Y.
Yue, W.
Kwang Hong, L.
Zhihong, L.
Hanlin, X.
Siau Ben, C.
Eng Kian, K.L.
Xing, Z.
Tan, C.S.
format Article
author Khai, L.W.
Geok Ing, N.
Fitzgerald, E.A.
Soon Fatt, Y.
Yue, W.
Kwang Hong, L.
Zhihong, L.
Hanlin, X.
Siau Ben, C.
Eng Kian, K.L.
Xing, Z.
Tan, C.S.
author_sort Khai, L.W.
title High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers
title_short High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers
title_full High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers
title_fullStr High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers
title_full_unstemmed High-Frequency Characteristics of InGaP/GaAs Double Heterojunction Bipolar Transistor Epitaxially Grown on 200 mm Ge/Si Wafers
title_sort high-frequency characteristics of ingap/gaas double heterojunction bipolar transistor epitaxially grown on 200 mm ge/si wafers
publisher Institute of Electrical and Electronics Engineers Inc.
publishDate 2021
url https://scholarbank.nus.edu.sg/handle/10635/197878
_version_ 1800914928365731840