Study of metal gates & high-K dielectrics in nanoelectronics

Ph.D

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Main Author: MI YANYU
Other Authors: PHYSICS
Format: Theses and Dissertations
Language:English
Published: 2011
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/23163
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-231632024-10-25T19:48:34Z Study of metal gates & high-K dielectrics in nanoelectronics MI YANYU PHYSICS ONG CHONG KIM HUAN CHENG HON, ALFRED CMOSFETs, High-k dielectrics, Metal gates, Interfacial electronic structures, X-ray Photoemission Spectroscopy, Band alignment Ph.D DOCTOR OF PHILOSOPHY 2011-06-10T18:03:23Z 2011-06-10T18:03:23Z 2007-09-12 Thesis MI YANYU (2007-09-12). Study of metal gates & high-K dielectrics in nanoelectronics. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/23163 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
language English
topic CMOSFETs, High-k dielectrics, Metal gates, Interfacial electronic structures, X-ray Photoemission Spectroscopy, Band alignment
spellingShingle CMOSFETs, High-k dielectrics, Metal gates, Interfacial electronic structures, X-ray Photoemission Spectroscopy, Band alignment
MI YANYU
Study of metal gates & high-K dielectrics in nanoelectronics
description Ph.D
author2 PHYSICS
author_facet PHYSICS
MI YANYU
format Theses and Dissertations
author MI YANYU
author_sort MI YANYU
title Study of metal gates & high-K dielectrics in nanoelectronics
title_short Study of metal gates & high-K dielectrics in nanoelectronics
title_full Study of metal gates & high-K dielectrics in nanoelectronics
title_fullStr Study of metal gates & high-K dielectrics in nanoelectronics
title_full_unstemmed Study of metal gates & high-K dielectrics in nanoelectronics
title_sort study of metal gates & high-k dielectrics in nanoelectronics
publishDate 2011
url http://scholarbank.nus.edu.sg/handle/10635/23163
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