Interface study of high-k oxide and Ge for the future Ge based MOSFET device

Master's

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Bibliographic Details
Main Author: DENG WENSHENG
Other Authors: PHYSICS
Format: Theses and Dissertations
Language:English
Published: 2012
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/31591
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Institution: National University of Singapore
Language: English