Interface study of high-k oxide and Ge for the future Ge based MOSFET device
Master's
Saved in:
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2012
|
| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/31591 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| Language: | English |
| id |
sg-nus-scholar.10635-31591 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-315912015-01-13T05:15:21Z Interface study of high-k oxide and Ge for the future Ge based MOSFET device DENG WENSHENG PHYSICS FENG YUAN PING WANG SHIJIE NG CHEE MANG Interface study of high-k oxide and Ge for the future Ge based MOSFET device Master's MASTER OF SCIENCE 2012-03-31T18:00:38Z 2012-03-31T18:00:38Z 2011-08-15 Thesis DENG WENSHENG (2011-08-15). Interface study of high-k oxide and Ge for the future Ge based MOSFET device. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/31591 NOT_IN_WOS en |
| institution |
National University of Singapore |
| building |
NUS Library |
| country |
Singapore |
| collection |
ScholarBank@NUS |
| language |
English |
| topic |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| spellingShingle |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device DENG WENSHENG Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| description |
Master's |
| author2 |
PHYSICS |
| author_facet |
PHYSICS DENG WENSHENG |
| format |
Theses and Dissertations |
| author |
DENG WENSHENG |
| author_sort |
DENG WENSHENG |
| title |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| title_short |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| title_full |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| title_fullStr |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| title_full_unstemmed |
Interface study of high-k oxide and Ge for the future Ge based MOSFET device |
| title_sort |
interface study of high-k oxide and ge for the future ge based mosfet device |
| publishDate |
2012 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/31591 |
| _version_ |
1681081102599454720 |