Method to form uniform silicide features

US6281117

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Bibliographic Details
Main Authors:	CHAN, LAP, HO, CHAW SING, LI, FONG YAU SAM, NG, HOU TEE
Other Authors:	CHEMISTRY
Format:	Patent
Published:	2012
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/32597
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-32597
record_format	dspace
spelling	sg-nus-scholar.10635-325972015-07-29T07:03:43Z Method to form uniform silicide features CHAN, LAP HO, CHAW SING LI, FONG YAU SAM NG, HOU TEE CHEMISTRY CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SINGAPORE, SG) NATIONAL UNIVERSITY OF SINGAPORE US6281117 Granted Patent 2012-05-02T02:27:34Z 2012-05-02T02:27:34Z 2001-08-28 Patent CHAN, LAP,HO, CHAW SING,LI, FONG YAU SAM,NG, HOU TEE (2001-08-28). Method to form uniform silicide features. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/32597 NOT_IN_WOS PatSnap
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	US6281117
author2	CHEMISTRY
author_facet	CHEMISTRY CHAN, LAP HO, CHAW SING LI, FONG YAU SAM NG, HOU TEE
format	Patent
author	CHAN, LAP HO, CHAW SING LI, FONG YAU SAM NG, HOU TEE
spellingShingle	CHAN, LAP HO, CHAW SING LI, FONG YAU SAM NG, HOU TEE Method to form uniform silicide features
author_sort	CHAN, LAP
title	Method to form uniform silicide features
title_short	Method to form uniform silicide features
title_full	Method to form uniform silicide features
title_fullStr	Method to form uniform silicide features
title_full_unstemmed	Method to form uniform silicide features
title_sort	method to form uniform silicide features
publishDate	2012
url	http://scholarbank.nus.edu.sg/handle/10635/32597
_version_	1681081252466130944

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