Forbidden pitch improvement using modified illumination in lithography
10.1116/1.3054286
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sg-nus-scholar.10635-514192023-10-30T10:17:05Z Forbidden pitch improvement using modified illumination in lithography Ling, M.L. Tay, C.J. Quan, C. Chua, G.S. Lin, Q. MECHANICAL ENGINEERING 10.1116/1.3054286 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 27 1 85-91 JVTBD 2014-04-24T09:33:53Z 2014-04-24T09:33:53Z 2009 Article Ling, M.L., Tay, C.J., Quan, C., Chua, G.S., Lin, Q. (2009). Forbidden pitch improvement using modified illumination in lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 27 (1) : 85-91. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3054286 10711023 http://scholarbank.nus.edu.sg/handle/10635/51419 000265839000018 Scopus |
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MECHANICAL ENGINEERING Ling, M.L. Tay, C.J. Quan, C. Chua, G.S. Lin, Q. |
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Ling, M.L. Tay, C.J. Quan, C. Chua, G.S. Lin, Q. |
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Ling, M.L. Tay, C.J. Quan, C. Chua, G.S. Lin, Q. Forbidden pitch improvement using modified illumination in lithography |
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Ling, M.L. |
title |
Forbidden pitch improvement using modified illumination in lithography |
title_short |
Forbidden pitch improvement using modified illumination in lithography |
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Forbidden pitch improvement using modified illumination in lithography |
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Forbidden pitch improvement using modified illumination in lithography |
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Forbidden pitch improvement using modified illumination in lithography |
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forbidden pitch improvement using modified illumination in lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/51419 |
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