Forbidden pitch improvement using modified illumination in lithography

10.1116/1.3054286

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Main Authors: Ling, M.L., Tay, C.J., Quan, C., Chua, G.S., Lin, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/51419
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-514192023-10-30T10:17:05Z Forbidden pitch improvement using modified illumination in lithography Ling, M.L. Tay, C.J. Quan, C. Chua, G.S. Lin, Q. MECHANICAL ENGINEERING 10.1116/1.3054286 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 27 1 85-91 JVTBD 2014-04-24T09:33:53Z 2014-04-24T09:33:53Z 2009 Article Ling, M.L., Tay, C.J., Quan, C., Chua, G.S., Lin, Q. (2009). Forbidden pitch improvement using modified illumination in lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 27 (1) : 85-91. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3054286 10711023 http://scholarbank.nus.edu.sg/handle/10635/51419 000265839000018 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.3054286
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Ling, M.L.
Tay, C.J.
Quan, C.
Chua, G.S.
Lin, Q.
format Article
author Ling, M.L.
Tay, C.J.
Quan, C.
Chua, G.S.
Lin, Q.
spellingShingle Ling, M.L.
Tay, C.J.
Quan, C.
Chua, G.S.
Lin, Q.
Forbidden pitch improvement using modified illumination in lithography
author_sort Ling, M.L.
title Forbidden pitch improvement using modified illumination in lithography
title_short Forbidden pitch improvement using modified illumination in lithography
title_full Forbidden pitch improvement using modified illumination in lithography
title_fullStr Forbidden pitch improvement using modified illumination in lithography
title_full_unstemmed Forbidden pitch improvement using modified illumination in lithography
title_sort forbidden pitch improvement using modified illumination in lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/51419
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