Forbidden pitch improvement using modified illumination in lithography
10.1116/1.3054286
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Main Authors: | Ling, M.L., Tay, C.J., Quan, C., Chua, G.S., Lin, Q. |
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Other Authors: | MECHANICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/51419 |
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Institution: | National University of Singapore |
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