Swing effects in alternating phase shift mask lithography: Implications of low σ illumination

Swing effects in alternating phase shift mask lithography: Implications of low σ illumination

10.1116/1.2353840

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Bibliographic Details
Main Authors: Singh, N., Sun, H.Q., Foo, W.H., Mehta, S.S., Kumar, R., Adeyeye, A.O., Suda, H., Kubota, T., Kimura, Y., Kinoshita, H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57566
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/57566

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