Swing effects in alternating phase shift mask lithography: Implications of low σ illumination
10.1116/1.2353840
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sg-nus-scholar.10635-575662023-10-31T07:42:16Z Swing effects in alternating phase shift mask lithography: Implications of low σ illumination Singh, N. Sun, H.Q. Foo, W.H. Mehta, S.S. Kumar, R. Adeyeye, A.O. Suda, H. Kubota, T. Kimura, Y. Kinoshita, H. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2353840 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 5 2326-2330 JVTBD 2014-06-17T03:07:40Z 2014-06-17T03:07:40Z 2006 Article Singh, N., Sun, H.Q., Foo, W.H., Mehta, S.S., Kumar, R., Adeyeye, A.O., Suda, H., Kubota, T., Kimura, Y., Kinoshita, H. (2006). Swing effects in alternating phase shift mask lithography: Implications of low σ illumination. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 (5) : 2326-2330. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2353840 10711023 http://scholarbank.nus.edu.sg/handle/10635/57566 000241476500026 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Singh, N. Sun, H.Q. Foo, W.H. Mehta, S.S. Kumar, R. Adeyeye, A.O. Suda, H. Kubota, T. Kimura, Y. Kinoshita, H. |
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Article |
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Singh, N. Sun, H.Q. Foo, W.H. Mehta, S.S. Kumar, R. Adeyeye, A.O. Suda, H. Kubota, T. Kimura, Y. Kinoshita, H. |
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Singh, N. Sun, H.Q. Foo, W.H. Mehta, S.S. Kumar, R. Adeyeye, A.O. Suda, H. Kubota, T. Kimura, Y. Kinoshita, H. Swing effects in alternating phase shift mask lithography: Implications of low σ illumination |
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Singh, N. |
title |
Swing effects in alternating phase shift mask lithography: Implications of low σ illumination |
title_short |
Swing effects in alternating phase shift mask lithography: Implications of low σ illumination |
title_full |
Swing effects in alternating phase shift mask lithography: Implications of low σ illumination |
title_fullStr |
Swing effects in alternating phase shift mask lithography: Implications of low σ illumination |
title_full_unstemmed |
Swing effects in alternating phase shift mask lithography: Implications of low σ illumination |
title_sort |
swing effects in alternating phase shift mask lithography: implications of low σ illumination |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/57566 |
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