Swing effects in alternating phase shift mask lithography: Implications of low σ illumination

• Main Authors: Singh, N., Sun, H.Q., Foo, W.H., Mehta, S.S., Kumar, R., Adeyeye, A.O., Suda, H., Kubota, T., Kimura, Y., Kinoshita, H.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/57566
• Institution: National University of Singapore

10.1116/1.2353840