Swing effects in alternating phase shift mask lithography: Implications of low σ illumination
10.1116/1.2353840
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Main Authors: | Singh, N., Sun, H.Q., Foo, W.H., Mehta, S.S., Kumar, R., Adeyeye, A.O., Suda, H., Kubota, T., Kimura, Y., Kinoshita, H. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/57566 |
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Institution: | National University of Singapore |
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