A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET

10.1109/LED.2007.914103

Saved in:
Bibliographic Details
Main Authors: Tan, K.-M., Zhu, M., Fang, W.-W., Yang, M., Liow, T.-Y., Lee, R.T.P., Hoe, K.M., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/54254
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-54254
record_format dspace
spelling sg-nus-scholar.10635-542542024-11-11T18:19:53Z A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET Tan, K.-M. Zhu, M. Fang, W.-W. Yang, M. Liow, T.-Y. Lee, R.T.P. Hoe, K.M. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Contact etch stop layer (CESL) Diamond-like carbon (DLC) Enhancement Pitch Strain Stress 10.1109/LED.2007.914103 IEEE Electron Device Letters 29 2 192-194 EDLED 2014-06-16T09:29:11Z 2014-06-16T09:29:11Z 2008-02 Article Tan, K.-M., Zhu, M., Fang, W.-W., Yang, M., Liow, T.-Y., Lee, R.T.P., Hoe, K.M., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C. (2008-02). A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET. IEEE Electron Device Letters 29 (2) : 192-194. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2007.914103 07413106 http://scholarbank.nus.edu.sg/handle/10635/54254 000252622800019 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Contact etch stop layer (CESL)
Diamond-like carbon (DLC)
Enhancement
Pitch
Strain
Stress
spellingShingle Contact etch stop layer (CESL)
Diamond-like carbon (DLC)
Enhancement
Pitch
Strain
Stress
Tan, K.-M.
Zhu, M.
Fang, W.-W.
Yang, M.
Liow, T.-Y.
Lee, R.T.P.
Hoe, K.M.
Tung, C.-H.
Balasubramanian, N.
Samudra, G.S.
Yeo, Y.-C.
A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
description 10.1109/LED.2007.914103
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Tan, K.-M.
Zhu, M.
Fang, W.-W.
Yang, M.
Liow, T.-Y.
Lee, R.T.P.
Hoe, K.M.
Tung, C.-H.
Balasubramanian, N.
Samudra, G.S.
Yeo, Y.-C.
format Article
author Tan, K.-M.
Zhu, M.
Fang, W.-W.
Yang, M.
Liow, T.-Y.
Lee, R.T.P.
Hoe, K.M.
Tung, C.-H.
Balasubramanian, N.
Samudra, G.S.
Yeo, Y.-C.
author_sort Tan, K.-M.
title A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
title_short A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
title_full A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
title_fullStr A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
title_full_unstemmed A high-stress liner comprising diamond-like carbon (DLC) for strained p-channel MOSFET
title_sort high-stress liner comprising diamond-like carbon (dlc) for strained p-channel mosfet
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/54254
_version_ 1821207777400324096