Boron profile narrowing in laser-processed silicon after rapid thermal anneal
10.1149/1.1633764
Saved in:
Main Authors: | , , , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55221 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-55221 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-552212023-10-26T08:33:06Z Boron profile narrowing in laser-processed silicon after rapid thermal anneal Poon, C.H. Tan, L.S. Cho, B.J. See, A. Bhat, M. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.1633764 Journal of the Electrochemical Society 151 1 G80-G83 JESOA 2014-06-17T02:40:35Z 2014-06-17T02:40:35Z 2004 Article Poon, C.H., Tan, L.S., Cho, B.J., See, A., Bhat, M. (2004). Boron profile narrowing in laser-processed silicon after rapid thermal anneal. Journal of the Electrochemical Society 151 (1) : G80-G83. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1633764 00134651 http://scholarbank.nus.edu.sg/handle/10635/55221 000187428800067 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
10.1149/1.1633764 |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING Poon, C.H. Tan, L.S. Cho, B.J. See, A. Bhat, M. |
format |
Article |
author |
Poon, C.H. Tan, L.S. Cho, B.J. See, A. Bhat, M. |
spellingShingle |
Poon, C.H. Tan, L.S. Cho, B.J. See, A. Bhat, M. Boron profile narrowing in laser-processed silicon after rapid thermal anneal |
author_sort |
Poon, C.H. |
title |
Boron profile narrowing in laser-processed silicon after rapid thermal anneal |
title_short |
Boron profile narrowing in laser-processed silicon after rapid thermal anneal |
title_full |
Boron profile narrowing in laser-processed silicon after rapid thermal anneal |
title_fullStr |
Boron profile narrowing in laser-processed silicon after rapid thermal anneal |
title_full_unstemmed |
Boron profile narrowing in laser-processed silicon after rapid thermal anneal |
title_sort |
boron profile narrowing in laser-processed silicon after rapid thermal anneal |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/55221 |
_version_ |
1781412091559673856 |