Boron profile narrowing in laser-processed silicon after rapid thermal anneal

10.1149/1.1633764

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Main Authors: Poon, C.H., Tan, L.S., Cho, B.J., See, A., Bhat, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55221
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-552212023-10-26T08:33:06Z Boron profile narrowing in laser-processed silicon after rapid thermal anneal Poon, C.H. Tan, L.S. Cho, B.J. See, A. Bhat, M. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.1633764 Journal of the Electrochemical Society 151 1 G80-G83 JESOA 2014-06-17T02:40:35Z 2014-06-17T02:40:35Z 2004 Article Poon, C.H., Tan, L.S., Cho, B.J., See, A., Bhat, M. (2004). Boron profile narrowing in laser-processed silicon after rapid thermal anneal. Journal of the Electrochemical Society 151 (1) : G80-G83. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1633764 00134651 http://scholarbank.nus.edu.sg/handle/10635/55221 000187428800067 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1149/1.1633764
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Poon, C.H.
Tan, L.S.
Cho, B.J.
See, A.
Bhat, M.
format Article
author Poon, C.H.
Tan, L.S.
Cho, B.J.
See, A.
Bhat, M.
spellingShingle Poon, C.H.
Tan, L.S.
Cho, B.J.
See, A.
Bhat, M.
Boron profile narrowing in laser-processed silicon after rapid thermal anneal
author_sort Poon, C.H.
title Boron profile narrowing in laser-processed silicon after rapid thermal anneal
title_short Boron profile narrowing in laser-processed silicon after rapid thermal anneal
title_full Boron profile narrowing in laser-processed silicon after rapid thermal anneal
title_fullStr Boron profile narrowing in laser-processed silicon after rapid thermal anneal
title_full_unstemmed Boron profile narrowing in laser-processed silicon after rapid thermal anneal
title_sort boron profile narrowing in laser-processed silicon after rapid thermal anneal
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/55221
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